Arthur Sherman,Ph.D.
Intellectual Property Consulting, and
R&D in Chemical Vapor Deposition
and Atomic Layer Deposition.
R&D in Chemical Vapor Deposition
and Atomic Layer Deposition.
Dr. Arthur Sherman has been an active
researcher in fluid dynamics, plasma
physics, and thin film deposition for
semiconductor fabrication for many years.
In the latter area he has carried out
pioneering developments in chemical vapor
deposition (CVD), and more recently
atomic layer deposition (ALD). He has
published over 50 papers, and three
reference texts. As well as being the holder
of more than ten US patents, he has also
served as an Expert Witness in a number of
patent litigation cases.
researcher in fluid dynamics, plasma
physics, and thin film deposition for
semiconductor fabrication for many years.
In the latter area he has carried out
pioneering developments in chemical vapor
deposition (CVD), and more recently
atomic layer deposition (ALD). He has
published over 50 papers, and three
reference texts. As well as being the holder
of more than ten US patents, he has also
served as an Expert Witness in a number of
patent litigation cases.
